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Polishing & Buffing Pad Conditioner

Regular price $9.99
Regular price Sale price $9.99
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Chemical Guys Polishing Pad Conditioner lubricates buffing and polishing pads to reduce wear and tear, and produce superior polishing results. Dry rubbing builds up excess heat and friction, which reduces the effectiveness of polish abrasives and wears down buffing pads prematurely.

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$9.99
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What Makes Polishing & Buffing Pad Conditioner Awesome

Reduces Friction

Machine polishing is the fine detailing art that balances machine power, abrasives, and friction to remove swirls and scratches, and restore luster to paint. Dry buffing pads generate excess heat and cause marring and other inconsistent paint removal marks. Chemical Guys Polishing Pad Conditioner lubricates buffing pads and polish abrasives to extend work time, reduce marring marks, and reduce the chances of burning paintwork from excess pad friction.

Works on All Buffing Pads

No matter the pad, chemical, or machine, use Polishing Pad Conditioner to lubricate and prime the pad for superior results with fewer passes in less time. Polishing Pad Conditioner extends polish work time to properly use all of the particle abrasive and refine the finish.

  • Prime polishing pads for superior results
  • Add lubrication to extend polish work time
  • Reduces compound dusting and residue
  • Works on all foam, microfiber, and wool pads
  • Make your pads last and last


How To Use Polishing & Buffing Pad Conditioner

  1. Prime buffing and polishing pads with Polishing Pad Conditioner for fast and even results every time.
  2. Place 5 - 6 dots of your favorite Chemical Guys compound or polish across the buffing pad.
  3. Mist the pad with 1 - 3 spritzes of Polishing Pad Conditioner.
  4. Use Chemical Guys Polishing Pad Conditioner on any foam, microfiber, or wool buffing and polishing pads whenever compounding or polishing.

Product Details

SKU(s) BUF_301_16, BUF_301_04
Product Form Liquid

Chemical & Ingredient Information

Chemical disclosures and material safety data sheet.

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